A dynamic and multipurpose experimental system has been designed and developed to undertake basic and applied research on plasma sources, diagnostics, and deposition of different functional materials.
The design structure involves the generation of high-density plasmas and radicals for various applications ranging from a small (2") to a large area (8") substrate. System assembly is going on.
Funding from: SERB-DST (ongoing)
Also, looking for Industry support and funding partner for any application oriented work using this system.
Industry support (ongoing)
Understanding plasma source and its associated plasma behavior and plasma chemistry are the crucial factors to recognize and improve plasma processes for plasma application. For the mass scale fabrication of these materials, we require the examination of the operation/parameter space, determination of the favorable process conditions and a better understanding of the plasma.
Simulation study of a CCP system has been initiated, and the results will be used for the development of the experimental system.
Looking for Industry support for this work.
Plasma is an ionized state of matter consisting of electrons, ions, neutrals, free radicals, and radiation, including UV light. Non-thermal atmospheric pressure plasmas (APPs) have shown the potential for numerous applications. APPs, due to their capabilities to produce highly activated species and reactive chemistries, have been studied for their use in different areas apart from surface treatment and sterilization. Considerable theoretical and experimental studies are going on to understand the mechanism of plasma generation, formation of radicals and species, and the plasma chemistry in such plasmas.
Simulation study of a CCP system has been initiated, and the results will be used for the development of the experimental system.
Status: Ongoing
Also, looking forward to industrial and funding partners to take up projects and collaboration.
We consider corona model and local thermal equilibrium approximations of a real plasma to present measurements of electron temperature (Te) and density (ne), respectively, using optical emission spectroscopy (OES) method in dual-frequency pulsed capacitively coupled plasmas (CCPs) in a reactive mixture of Ar/O2/C4F8 at low operating pressure. The operation conditions like DC continuous and synchronized were used for the study and plasma characterization for the intended plasma application like high aspect ratio etching (HARE). We show that the present plasma conditions are dominated by a corona balance rather than the supremacy of multi-step excitation. This fact has enabled us to utilize the modified Boltzmann plot technique to evaluate Te values. In the second method, we simultaneously use the Boltzmann and Saha equations to determine the ne value using the line intensity ratio and the value of Te. Time-resolved measurements of Te and ne were performed for completeness, and the insight of the pulsed discharge is investigated. Time evolution of ne and Te using the OES method revealed a similar trend in the change of plasma parameters indicating electron impact ionization during the pulse on phase. It was seen that ne in the afterglow speedily decreased within a short time of ∼5 µs. Analysis suggests the formation of afterglow plasmas, which composed of positive and negative ions with very low electron density. Results revealed that the DC synchronized operation could be useful for the plasma application like HARE due to different plasma characteristics. It also suggests the production of ion-ion plasmas by the effective utilization of negative ions in the afterglow phase. The corona balance condition was validated in our experiments, and the results were compared with the existing literature.
This method can be useful for all laboratory and industrial plasmas operating with Ar.
Design of plasma source, diagnostic and plasma processes for energy and electronic materials and societal applications.
Recent publication(s) via this collaboration:
Advanced Plasma source, probe and optical diagnostics for high aspect ratio etching for devices.
Recent publication(s) via this collaboration:
Conference Papers:
Plasma Lab (Plasma Physics laboratory) at IIT Delhi is my Alma mater. The Lab is a joint activity of the Department of Energy Science and Engineering and the Physics Department with thrust on different plasma sources and plasma-based applications. Since the 1980s, the activities of the plasma lab have been expanding, and currently, there are four laboratories (including this MFPL) with various ongoing activities in different areas for societal welfare.
I am looking forward to industrial and funding partners to taking up projects and collaboration.
Understanding the mechanism of plasma generation in plasma sources, diagnostic development, and application of plasma sources for numerous societal applications