Publications

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Plasma Source, Plasma Processes, Nanoscience and Plasma Diagnostics

  1. Nisha and B. B. Sahu, "Overall aspect for designing magnetron sputtering plasma sources and their applications in the deposition of ITO films" AIP Advances 14, 050702 (2024)
  2. Salini Datta, J. G. Han, R. Kumar, and B. B. Sahu, "Experimental studies and COMSOL 1-D simulation in Ar capacitively coupled plasmas" AIP Advances 14, 015046 (2024)
  3. B. B. Sahu, K. Nakane, K. Ishikawa, M. Sekine, T. Tsutsumi, T. Gohira, Y. Ohya, N. Ohno and M. Hori, "Study of optical emission spectroscopy using modified Boltzmann plot in dual frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O2/C4F8 plasma etching process" Phys. Chem. Chem. Phys., 2022, DOI: 10.1039/D2CP00289B
  4. L. Wen, B. B. Sahu, G. Y. Yeom and J. G. Han “Room temperature deposition of very thin and flexible crystalline ITO thin film using 3-D facing-magnetron sputtering plasma source” Vacuum, 193, 110520 (2021) (ISSN: 0042-207X)
  5. L. Wen, B. B. Sahu, G. Y. Yeom, J. G. Han “Improved Electrical and Optical Properties of Ultra-Thin Tin Doped Indium Oxide (ITO) Thin Films by a 3-Dimensionally Confined Magnetron Sputtering Source” Sci. Advanced Mater. 13, 498 (2021)
  6. B. B. Sahu, Min W. Lee, W. Long, J. Han “Role of plasma parameters on the characteristics properties of flexible transparent ITO films deposited by 3-D facing and planar facing magnetron sources” AIP Advances 10,105231 (2020) (ISSN: 2158-3226)
  7. N. Liu, J. Kim, J. Oh, Q. T. Nguyen, B. B. Sahu, J. G. Han, S. Kim, “Growth of multi-orientated polycrystalline MoS2 using plasma-enhanced chemical vapor deposition for efficient hydrogen evolution reactions, Nanomaterials 10, 1465 (2020) (ISSN 2079-4991).
  8. S. Kar, B. B. Sahu, H. Kousaka, J. G. Han, M. Hori, “Study of the effect of normal load on friction coefficient and wear properties of CNx thin films” AIP Advances 10, 065214 (2020) (ISSN: 2158-3226).
  9. B. B. Sahu, S. H. Kim, S. Kim, J. G. Han, S. Kim “Plasma diagnostic in LiMn2O4 thin film process for Li-ion battery application” Surface and Coatings Technology 126066, 397 (2020) (ISSN: 0257-8972).
  10. B. B. Sahu, S. I. Kim, M. W. Lee, J. G. Han “Effect of helium incorporation on plasma parameters and characteristic properties of hydrogen free carbon films deposited using DC magnetron sputtering” Journal of Applied Physics, 127, 014901 (2020) (ISSN: 0021-8979).
  11. B. B. Sahu, W. Long, S. H. Kim, J. G. Han “Study of plasma characteristic and properties of flexible ultra-thin ITO films prepared by large area 3-D confined and planar magnetron sputtering” Vacuum, 165, 246-253 (2019) (ISSN: 0042-207X).
  12. J. S. Lee, B. B. Sahu, J. G. Han, “Effect of the RF power on the characteristic properties of high-performance silicon nitride single-layer permeation barriers” Surface and Coatings Technology, 364, 63-69 (2019) (ISSN: 0257-8972).
  13. W. Long, B. B. Sahu, J. G. Han “Study on the electrical, optical, structural, and morphological properties of highly transparent and conductive AZO thin films prepared near room temperature” Applied Surface Science, 473, 649–656 (2019) (ISSN: 0169-4332).
  14. B. B. Sahu, J. S. Lee, S. H. Kim and J. G. Han, “Comparison of plasma characteristics in normal and multiple holes hollow cathode RF PECVD and their effectiveness for a-SiNx:H thin film deposition” Vacuum, 160, 316-324 (2019) (ISSN: 0042-207X).
  15. B. B. Sahu, W. Long, J. H. Kwon, and J. G. Han “Factors affecting the properties of highly conductive flexible ultrathin ITO films in confined large area magnetron sputtering in three dimensions” AIP Advances, 8, 105112 (2018) (ISSN: 2158-3226).
  16. H. R. Kim, B. B. Sahu, and J. G. Han “Direct Synthesis of Magnetron Sputtered Nanostructured Cu Films with Desired Properties via Plasma Chemistry for their Efficient Antibacterial Application” Plasma Processes and Polymers, 15, e1800009 (2018) (ISSN: 1612-8869).
  17. W. Long, B B. Sahu, and J. G. Han “Approach for the optimization of characteristic properties of very high conductive ITO thin films using advanced magnetron plasma process” Materials Research Express, 5, 066415 (2018) (ISSN: 2053-1591).
  18. B. B. Sahu, S. B. Jin, P. J. Xiao, J. B. Kim, and J. G. Han “Effect of inductively coupled plasma and plasma parameters on magnetron sputtered Al-Doped ZnO highly conductive thin films at Low-temperature” Journal of Applied Physics, 123, issue 20, 205107 (2018) (ISSN: 0021-8979).
  19. B. B. Sahu, W. Long, and J. G. Han “Highly conductive flexible ultra thin ITO nanoclusters prepared by 3-D confined magnetron sputtering at a low temperature” Scripta Materialia, 149, 98-102 (2018) (ISSN: 1359-6462).
  20. B. B. Sahu, J. G. Han, and H. Toyoda “Effectiveness of plasma and radical control for the low temperature synthesis and properties of a-SiNx:H films using RF-Microwave PECVD” Physics of plasmas, 25, 023511 (2018) (ISSN: 1070-664X).
  21. B. B. Sahu, Y. Yin, and J. G. Han “Controlled Growth, Microstructure and Properties of Functional Si Quantum Dot Films via Plasma Chemistry and Activated Radicals” Journal of Physical Chemistry C, 121, 10194-10209 (2017) (ISSN: 1932-7447).
  22. B. B. Sahu, J. G. Han, and H. Kersten “Shaping thin film growth and microstructure pathways via plasma and deposition energy: a detailed theoretical, computational and experimental analysis” Physical Chemistry Chemical Physics, 19, 5591-5610 (2017) (ISSN 1463-9076).
  23. J. S. Lee, B. B. Sahu, and J. G. Han, “Simple realization of efficient barrier performance of a single layer silicon nitride film simply via plasma chemistry” Physical Chemistry Chemical Physics, 18, 32198- 32209 (2016) (ISSN 1463-9076).
  24. B. B. Sahu, Y. Yin, S. Gauter, H. Kersten, and J. G. Han “Plasma engineering of silicon quantum dots and their properties through energy deposition and chemistry” Physical Chemistry Chemical Physics, 18, 25837- 25851 (2016) (ISSN 1463-9076).
  25. B. B. Sahu, Y. Y. Yin, J. S. Lee, J. G. Han, and M. Shiratani “Plasma diagnostic approach for the low-temperature deposition of silicon quantum dots using dual frequency PECVD” Journal of Physics D: Applied Physics, 49, issue 39, 395203 (2016) (ISSN: 1361-6463).
  26. B. B. Sahu, Y. Y. Yin, J. G. Han, and M. Shiratani “Low temperature synthesis of silicon quantum dots made with plasma chemistry control in dual frequency non-thermal plasmas” Physical Chemistry Chemical Physics, 18, 15697- 15710, (2016) (ISSN 1463-9076).
  27. B. B. Sahu, Y. Y. Yin, T. Tsutsumi, M. Hori, and J. G. Han, “The Role of plasma chemistry on functional silicon nitride films properties deposited at low-temperature by mixing two frequency powers using PECVD” Physical Chemistry Chemical Physics, 18, 13033, (2016) (ISSN 1463-9076).
  28. B. B. Sahu, Y. Y. Yin and J. G. Han “Effect of plasma parameters on characteristics of silicon nitride film deposited by single and dual frequency PECVD” Physics of Plasmas, 23, issue 1, 033512, (2016) (ISSN: 1070-664X).
  29. B. B. Sahu, K. S. Shin, and J. G. Han “Integrated Approach for Low Temperature Synthesis of High Quality Silicon Nitride Films in PECVD using RF/UHF Hybrid Plasmas” Plasma Sources Science and Technology, 25, issue 1, 015017, (2016) (ISSN: 1361-6595).
  30. B. B. Sahu, Jeon G. Han, J. B. Kim, M. Kumar, S. B. Jin, and M. Hori, “Study of plasma properties for the low-temperature deposition of highly conductive Aluminum doped ZnO film using ICP assisted DC magnetron sputtering” Plasma Processes and Polymers, 13, issue 1, 134-146 (2016) (ISSN: 1612-8869).
  31. B. B. Sahu, J. G. Han, K. S. Shin, and M. Hori “Nitrogen radical and plasma diagnostics in dual frequency hybrid plasmas to investigate N2/SiH4 PECVD process” Plasma Processes and Polymers, 13, issue 4, 447-458 (2016) (ISSN: 1612-8869).
  32. K. S. Shin, B. B. Sahu, M. Kumar, K. Leksakul, and J. G. Han, “Tailoring of microstructure in hydrogenated nanocrystalline Si thin Flms by ICP-assisted RF magnetron sputtering” Journal of Physics D: Applied Physics, 48, 475303 (2015) (ISSN: 1361-6463).
  33. L. Wen, M. Kumar, B. B. Sahu, S. B. Jin, C. Sawangrat, K. Lekasakul, J.G. Han, “Advantage of dual-confined Plasmas over conventional and facing-target Plasmas for improving transparent-conductive properties in Al doped ZnO thin films”, Surface and Coatings Technology, 284, 85-89 (2015) (ISSN: 0257-8972).
  34. S. I. Kim, K. W. Lee, B. B. Sahu and J. G. Han, “Flexible OLED fabrication with ITO thin film on polymer substrate” Japanese Journal of Applied Physics, 54, 090301 (2015) (ISSN: 1347-4065).
  35. M. Kumar, L. Wen, B. B. Sahu and J. G. Han, “Simultaneous enhancement of carrier mobility and concentration via tailoring of Al-chemical states in Al-ZnO thin films” Applied Physics Letters, 106, 241903 (2015) (ISSN: 0003-6951).
  36. B. B. Sahu, J. G. Han, K. S. Shin, K. Ishikawa, M. Hori and Y. Miyawaki, “Plasma diagnostic approach for high rate nanocrystalline Si synthesis in RF/UHF hybrid plasmas using PECVD process” Plasma Sources Science and Technology, 24, 025019 (2015) (ISSN: 1361-6595).
  37. B. B. Sahu, J. G. Han, M. Hori, and K. Takeda, “Langmuir probe and optical emission spectroscopy studies in magnetron sputtering plasmas for Al-doped ZnO film deposition” Journal of Applied Physics 117, 023301 (2015) (ISSN: 0021-8979).
  38. K. S. Shin, B. B. Sahu, J. G. Han, and M. Hori, “Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in ICP assisted magnetron sputtering” Japanese Journal of Applied Physics 54, 060303 (2015) (ISSN: 1347-4065).
  39. S. B. Jin, W. Long, B. B. Sahu, and J. G. Han, “Improving the Gas Barrier and Mechanical Properties of a-SiOx Films Synthesized at Low Temperature By Using High Energy and Hydrogen Flow Rate Control” Journal of Korean Physical Society 66, issue 9, 1410-1415 (2015) (ISSN: 0374-4884,).
  40. S. I. Kim, B. B. Sahu, S. E. Kim, A. Ali, E. H. Choi, and J. G. Han, “Controlling conductivity of carbon film for L-929 Cell biocompatibility using magnetron sputtering plasmas” Journal of Materials Chemistry B, 3, 3267-3278 (2015) (ISSN 2050-750X).
  41. S. I. Kim, B. B. Sahu, B. M. Weon, J. G. Han, J. Koskinen, and S. Franssila, “Making porous conductive carbon films with unbalanced magnetron sputtering” Japanese Journal of Applied Physics 54, 010304 (2015) (ISSN: 1347-4065).
  42. B. B. Sahu, Kyung S. Shin, Su. B. Jin, Jeon G. Han, K. Ishikawa, and M. Hori, “Effectiveness of Plasma Diagnostic in UHF and RF Hybrid Plasmas for Synthesis of Silicon Nitride Film at Low Temperature” Journal of Applied Physics 116, 134903 (2014) (ISSN: 0021-8979).

    43. Basic Plasma Sources and Plasma Technologies

  43. B. B. Sahu, L. Wen, and J. G. Han “Instabilities and plasma flares in moderate-current confined magnetron sputtering in three dimensions” Physical Review Applied, 10, 054042 (2018) (ISSN 2331-7019).
  44. L. Wen, B. B. Sahu, and J. G. Han “Development and utility of a new 3-D magnetron source for high rate deposition of highly conductive ITO thin films near room temperature” Physical Chemistry Chemical Physics, 20, 4818-4830 (2018) (ISSN 1463-9076).
  45. B. B. Sahu, S. Koga, H. Toyoda, and J. G. Han, “Development and plasma characterization of an 850 MHz surface-wave plasma source” AIP Advances, 7, 105213 (2017) (ISSN: 2158-3226).
  46. B. B. Sahu, S. B. Jin, and J. G. Han, “Development and characterization of a multi-electrode cold atmospheric pressure DBD plasma jet aiming plasma application” Journal of Analytical Atomic Spectrometry, 32, 782-795, (2017) DOI: 10.1039/c6ja00419a (ISSN: 0267-9477).
  47. B. B. Sahu and J. G. Han, “Comparison of plasma excitation, ionization and energy influx in single and dual frequency capacitive discharges” Physics of plasmas, 23, 123504, issue 12 (2016) (ISSN: 1070-664X).
  48. B. B. Sahu and J. G. Han, “Electron heating mode transition induced by mixing radio frequency and ultrahigh frequency dual frequency powers in capacitive discharges” Physics of Plasmas, 23, 053514, issue 5 (2016) (ISSN: 1070-664X).
  49. B. B. Sahu, J. G. Han, H. R. Kim, K. Ishikawa, and M. Hori, “Experimental evidence of warm electron populations in magnetron sputtering plasmas” Journal of Applied Physics 117, issue 3, 033301 (2015) (ISSN: 0021-8979).
  50. K. S. Shin, B. B. Sahu, J. G. Han, and M. Hori, “Utility of dual frequency hybrid source on plasma and radical generation in SiH4/H2 PECVD process” Japanese Journal of Applied Physics 54, 076201(2015) (ISSN: 1347-4065).
  51. B. B. Sahu, A. Ganguli & R. D. Tarey, “Warm electrons are responsible for helicon plasma production” Plasma Sources Science and Technology 23, 065050 (2014) (ISSN: 1361-6595).
  52. B. B. Sahu, R.D. Tarey, and A. Ganguli “Experimental Investigation of Current Free Double Layers in Helicon Plasmas” Physics of Plasmas 21, 023504 (2014) (ISSN: 1070-664X).
  53. B. B. Sahu, A. Ganguli, and R.D. Tarey, “Observation of Multiple Current Free Helicon Double Layers” Applied Physics Letters 103, 184105-1 (2013) (ISSN:0003-6951).
  54. A. Ganguli, B. B. Sahu, and R.D. Tarey, “Evidence of current free double layer in high density helicon discharge” Physics of Plasmas 20, 013510 (2013) (ISSN:1070-664X).
  55. R. D. Tarey, B. B. Sahu and A. Ganguli, “Understanding Helicon Plasmas”, Physics of Plasmas 19, issue 7, 073520 (2012) (ISSN: 1070-664X).
  56. A. Ganguli, B. B. Sahu and R. D. Tarey, ‘Investigation of absorption mechanisms in helicon discharges in conducting waveguides’ Plasma Sources Science and Technology 20, 015021 (2011) (ISSN: 1361-6595).
  57. A. Ganguli, B. B. Sahu, and R.D. Tarey, “A new structure for RF compensated Langmuir probes with external filters tunable in absence of plasma” Plasma Sources Science and Technology 17, 015003 (2008) (ISSN: 1361-6595).
  58. A. Ganguli, B. B. Sahu, and R.D. Tarey, “Helicon wave modes, their damping and absorption in lossy plasma loaded conducting waveguide” Physics of Plasmas 14, issue 11, 113503 (2007) (ISSN: 1070-664X).

    59. Fusion Plasmas

  59. B. B. Sahu, Y. S. Bae, J. H. Jeong, M. Joung, J. G. Kwak, W. S. Han and I. Rhee, “ECCD Performance Analysis of future KSTAR ECH systems for Extended Applications” Journal of Korean Physical Society 65, issue 8, 1282-1289 (2014) (ISSN: 0374-4884).