Welcome to

Multi-functional Plasma Laboratory

About

About Me

I look upon myself as a scientist in plasma sources and diagnostics. I have developed different kinds of plasma sources, and diagnostic tools for different kinds of plasma applications. Since last 7-8 years, I have been working in the areas of plasma based numerous applications in material processing, bio and healthcare, energy and electronic applications.

  • Name: Bibhuti Bhushan Sahu
  • Researcher ID: N-2453-2017
  • Scopus Author ID: 56472442800
  • Orcid: 0000-0002-1012-9559
  • Email: bibhutisahu@gmail.com, bbsahu@dese.iitd.ac.in
  • Phone: +91-11-2659-1259
Colorlib Template
Colorlib Template
Colorlib Template
Colorlib Template
Colorlib Template
Colorlib Template

Highlights & News

Highlights & News

Highlights

  • Join us at the IPPD 2024: The 1st Global Forum and International Workshop, bridging the realms of industrial plasma processes and diagnostics, in a hybrid mode experience on May 09-10, 2024. Website Link

  • Publications

    Salini Datta, J. G. Han, R. Kumar, and B. B. Sahu, "Experimental studies and COMSOL 1-D simulation in Ar capacitively coupled plasmas" AIP Advances 14, 015046 (2024).

News

  • MoU made for developing process technology for diamond crystal.

  • MoU made for developing process technology for healthcare.

Vacancy & Collaboration

  • Research

    Part time scholar and candidate with JRF for full time research are welcome.

  • Industrial Partners

    I am looking forward to industrial partners for collaboration, consultation and taking up projects using plasma technologies. Please discuss your problem to find a solution. Looking for a closed and tight collaboration with mutual interest.

I'm endeavoring to secure additional funding for other activities.

Awards & Recognition

Sept 2021 - Present

Member of the International Scientific Committee

Asian-European International Conference on Plasma Surface Engineering (AEPSE 2023, AEPSE 2021)
Jan 2021 - Mar 2021

Visiting Faculty

Nagoya University, Japan
2020

IOP Trusted Reviewer Status

2014-2015

Best Faculty Award

DCE, Gurgaon, India

Professional Info

Nov 2020 - Present

Associate Professor

Department of Energy Science and Engineering (DESE), IIT Delhi, India
Oct 2019 - Nov 2020

Designated Professor

Center for Low-Temperature Plasma Sciences, Graduate School of Engineering, Nagoya University, Japan
Jan 2014 - June 2019

Research Professor

Center for Advanced Plasma Surface Technology (CAPST), School of Advanced Materials Science and Engineering, SKKU, South Korea
Oct 2012 - Dec 2013

Senior Researcher

National Fusion Research Institute (NFRI), South Korea
Jan 2012 - Sept 2012

Associate Professor

Department of Applied Sciences & Humanities, DCE, India
Sept 2009 - Dec 2011

Assistant Professor

Department of Applied Sciences & Humanities, DCE, India
Sept 2007 - Sept 2009

Project Scientist

Plasma Laboratory, IIT, Delhi, India
July 2005 - July 2006

Project Associate

Plasma Laboratory, IIT, Delhi, India
July 2000 - July 2005

Research Scholar

Physics Department, IIT, Delhi, India

Work Experience

Oct 2019 - Nov 2020

Nagoya University, Japan

The work I have undertaken relates to the:

  1. Study of the science of plasma sources and optimizing their capability for plasma applications.
  2. Advanced plasma processes for plasma etching and material processing.
  3. Optical diagnostics developed: OES and Laser Induced Photodetachment.

Jan 2014 - June 2019

Sungkyunkwan University (SKKU), South Korea

The work I have undertaken relates to the design and development of:

  1. Plasma sources and diagnostic tools for basic study of plasma generation, instability, electron heating, etc.
  2. Advanced plasma processes for their applications in material processing.
  3. Electronic, bio- and energy materials using plasma-based deposition methods like magnetron sputtering and plasma-enhanced chemical vapor deposition (PECVD), etc. This includes: low-temperature and high rate deposition of Si based thin films (nano-crystalline Si, amorphous Silicon Nitride, and Si quantum dots), Cu thin films, and transparent conductive oxide (TCO) films utilizing novel plasma processes.
  4. Small to large area atmospheric pressure plasma source for medicinal and agriculture applications.

Oct 2012 - Dec 2013

National Fusion Research Institute (NFRI), South Korea

The work undertaken relates to the:

  1. Involvement in the operation and upgrade plan of the two heating systems, e.g., the electron cyclotron heating (ECH) and lower hybrid current drive (LHCD) systems for steady state operation of the tokamak.
  2. Numerical computations using benchmark codes, engineering design of microwave components, study the capability of the heating system for the goal of steady state operation of tokamak, etc.
Sept 2009 - Sept 2012

Double layer study in helicon discharge at Plasma Lab IIT Delhi

I have conducted experiments on the formation of current-free double layers in helicon plasmas to investigate the acceleration and deceleration mechanism of the charged particle along with the formation of electron beam.

July 2000 - Aug 2008

Doctoral work at IIT Delhi, India

Experimental and theoretical work on helicon wave plasma sources

The theoretical work focused on the damping and absorption of helicon waves in lossy plasma confined in a conducting cylinder. On the basis of the theory developed, experiments were designed to:

  1. Determine the mechanism of power absorption at different pressures, magnetic field, etc.
  2. Investigate the mechanism by which high-energy electrons are produced in helicon plasmas, since helicon plasmas necessarily have a high energy electron population required for ionization of the background gas

Along with the basic experimental system, my work involved design and fabrication of various RF subsystems, diagnostic probes, and instrumentation for studying RF power absorption and ionization mechanisms in helicon plasmas.

Education

2008

Ph.D

Major: Applied Plasma Physics, Department of Physics, IIT Delhi, India

Thesis: Experimental and Theoretical Investigation on Helicon Wave Plasmas in Conducting Cylindrical Waveguide Lab: Plasma Lab IIT Delhi

1999

M.Sc. (Physics)

Utkal University
1997

B.Sc. (Physics)

Utkal University

Skills

Plasma Source for basic studies and plasma applications:

Capacitively and inductively coupled plasma source, ultra high-frequency plasma sources, hybrid plasma source, magnetron plasma source, dielectric barrier discharge source, atmospheric pressure plasma jet, and large area atmospheric pressure plasma source.

Plasma Diagnostics:

  • Normal and RF compensated Langmuir probe (Ph.D. Work)
  • B-dot and E probes (Ph.D. Work)
  • Laser Photodetachment, Optical emission spectroscopy (OES), ICCD imaging, optical absorption spectroscopy (OAS), vacuum ultraviolet absorption spectroscopy (VUVAS), interferometry, substrate temperature measurement, Energy flux on the substrate by Calorimetric probe, etc.

Instrumentation:

The design and fabrication of vacuum components, RF and microwave components, handling and the design of impedance matching unit, data acquisition system, instrumentation for the plasma diagnostics, etc.

Software:

Proficiency in platforms like Matlab, Fortran, HFSS, IDL, AutoCAD, MathCAD, Microsoft Visio, Microsoft Office, etc.

Journal Referee:

Applied Physics Letters (AIP), Physics of Plasmas (AIP), Journal of Applied Physics (AIP), AIP Advances (AIP), Plasma Sources Science and Technology (IOP), Plasma Science and Technology (IOP), Journal of Physics D: Applied Physics (IOP), Material Sciences and Semiconductor Processing (Elsevier), Journal of Physical Chemistry (ACS), Green Chemistry (RSC), Surface coating technology (Elsevier), Applied Surface Sciences (Elsevier), Vacuum (Elsevier), RSC advances (RSC), and Nanoscale (RSC)

Development of Plasma Processes and Functional Materials

Designed and developed plasma based processes for different kinds of materials
Materials developed by PECVD:

  • Energy materials: a-Si, nc-Si, Si-Q dots
  • lectronic materials: Barrier thin films

Materials developed by Magnetron sputtering:

  • a-Si, nc-Si, TCO (AZO, ITO), Cu, C, a-Si Q dots, LMO for Li Batteries

All Activities

All Activities

Projects

Projects

Here are the projects that have secured funding.

Institute Grant

Development of multi-target magnetron sputtering system for the deposition of transparent conductive oxide (TCO) materials on flexible substrates

Status: Completed

SERB-DST Grant

Investigation of electric fluctuation and plasma generation in a magnetron sputtering source and their role in the deposition of conductive thin films

Material type: Energy Material

Status: Ongoing

Industry Support

Study and development of plasma device for healthcare applications

I am trying to get some more funds for other activities.

Status: Ongoing

Projects: Quest for societal applications

Plasma science for societal applications (Energy, Food, Bio, electronics, etc.)

Low-temperature fabrication of functional nano-materials

Atmospheric pressure plasmas and their emerging applications

Other Low-pressure plasma applications

I'm endeavoring to secure additional funding for other activities.

Gallery

Gallery

..........................................................................................................................................

Contact

Contact Me

Address

Room No. 350A, Block-5, Department of Energy Sciences and Engineering, IIT Campus, Hauz Khas, New Delhi, 110016

Contact Number

+91-1126591259