Rajendra Singh

Advanced Semiconductor Materials and Devices Group

Department of Physics

Indian Insitute of Technology Delhi


Dr. Rajendra Singh is a Professor at the Department of Physics, IIT Delhi. He is also a Joint Faculty at the Department of Electrical Engineering, IIT Delhi. He did M.Sc. (Physics) from D.B.S. College, Dehra Dun (affiliated to H.N.B. Garhwal University) in 1995. After that he joined Inter University Accelerator Centre (formerly Nuclear Science Centre), New Delhi for Ph.D. His Ph.D. work was related to the study of the effect of swift heavy ion irradiation on electrical properties of Si and GaAs. He completed his Ph.D. in 2001 with degree from Jawaharlal Nehru University, New Delhi. He then joined Walter Schottky Institute (WSI), Technical University of Munich (TUM), Germany as a post-doctoral fellow. There he worked on the design, fabrication and characterization of InP-based heterojunction bipolar transistors (HBTs). He extensively used Class 100 Cleanroom facilities at WSI working on various processing tools such as photolithography, wet etching, reactive ion etching, UHV metallization and rapid thermal annealing. In January 2004 he joined the Max Planck Institute of Microstructure Physics, Halle, Germany as a post-doctoral fellow. There he worked in the area of direct wafer bonding and layer splitting of semiconductors for the fabrication of silicon-on-insulator (SOI) and strained silicon-on-insulator (sSOI). He worked in a Class 10 Cleanroom facility at MPI Halle using processing tools such as wet benches, wafer bonding system, plasma enhanced chemical vapour deposition (PECVD) and annealing furnaces. There he also initiated activities on hydrogen implantation induced layer splitting (called as ion cut process) of GaN, AlN and ZnO. He joined the Department of Physics, IIT Delhi in November, 2006. At present he is Professor in the Department of Physics, IIT Delhi. His areas of interest are GaN based materials and devices, gallium oxide based devices, growth and characterization of semiconductor nanowires, wafer bonding and layer splitting of crystalline materials, 2D-3D interfaces, 2D quantum materials and devices, CVD, MOCVD and MBE growth of semiconductors and quantum materials, Nanolithography and nanofabrication. He has made significant contributions for the establishing of state-of-the-art Nanoscale Research facility (NRF) at IIT Delhi. He has about 160 publications in International Journals and a similar number of publications in conference proceedings/edited volumes/abstracts in National/International conferences and workshops. He is the recipient of “MRSI Medal Award” for 2017. He also received “Teaching Excellence Award” from IIT Delhi in 2018.

Prof. Rajendra Singh

Recent Updates

On January 12, 2023, Kapil Narang defended his Ph.D. dissertation to earn his doctoral degree! Hearty congratulations, Kapil!"